Performance Analysis of High-K Dielectric Heterojunction High Electron Mobility Transistor for RF Applications

نویسندگان

چکیده

We have designed and simulated a 10-nanometer regime gate High Electron Mobility Transistor (HEMT) with an undoped region (UR) under the high k dielectric as hafnium oxide (HfO2). The thickness of metal gate(G) regions are equal but length channel(C) is not equivalent. proposed Undoped reduces maximum electric field(V) in channel increases drain current significantly. High-K structure obtained saturated Ion 60% higher than conventional structure. For critical Power High-frequency transmission Amplifiers utilizes AlGaN/GaN/SiC-based Hafnium oxide. Proposed advanced Produces Drain (Id), 54% transconductance (Gm) Low On-Resistance (Ron), conductivity comparison to typical Transistor. In Addition these improved characteristics, Electric field along Y direction also observed. formed by Low-k Dielectric materials process Silicon Dioxide(SiO2) High-k being Titanium Dioxide (TiO2) Oxide (HfO2) created more opportunities electronics radio frequency operations.

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ژورنال

عنوان ژورنال: International journal of engineering. Transactions A: basics

سال: 2023

ISSN: ['1728-1431']

DOI: https://doi.org/10.5829/ije.2023.36.09c.09